產(chǎn)品分類
RTP快速退火設(shè)備
所屬分類：
快速退火爐
概要：
◆ 快速退火爐是利用紅外熱輻射實(shí)現(xiàn)快速加熱的一種半導(dǎo)體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對(duì)位于工藝腔體的半導(dǎo)體硅片進(jìn)行快速加熱來實(shí)現(xiàn)穩(wěn)定的升溫過程
關(guān)鍵詞：
RTP快速退火
RTP快速退火設(shè)備
產(chǎn)品概述/Product Introduction：
◆ 快速退火爐是利用紅外熱輻射實(shí)現(xiàn)快速加熱的一種半導(dǎo)體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對(duì)位于工藝腔體的半導(dǎo)體硅片進(jìn)行快速加熱來實(shí)現(xiàn)穩(wěn)定的升溫過程
Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process
產(chǎn)品特點(diǎn)/Product Characteristics：
◆ 溫度控制精度高、重復(fù)性好
High temperature control precision and good repeatability
◆ 干凈清潔的工藝腔體
Clean and clean process chamber
◆ 用戶可根據(jù)要求定制工藝氣體,最多可配置6路氣體
Users can customize the process gas according to their requirements, and can configure up to 6channels of gas
◆ 工藝過程計(jì)算機(jī)全自動(dòng)控制
Computer automatic control of technological process
◆ 樣品尺寸:2-6英寸
Sample size: 2-6 inches
◆ 升降溫速率:0-100°C/S可控
Temperature rise and fall rate: 0-100 °c/s controllable
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